HfC(310) High Brightness Sources for Advanced Imaging Applications

Authors

William A. Mackie
Josh M. Lovell
Todd W. Curtis, George Fox UniversityFollow
Gerald G. Megara

Document Type

Article

Publication Date

2014

Publication Title

Journal of Vacuum Science and Technology

Abstract

The authors report on electron emission from HfC(310) operating in extended Schottky emission mode. Data are gathered from test stands as well as through operation in a commercial scanning electron microscope. Emitter end-form geometry consisted of rounded, via electrochemical etching, and truncated, via ion milling. The authors demonstrate high angular intensity operation of >60 mA/sr especially for the rounded end-form emitters. Advantages include robustness of the material, which is not reliant on material supply as is the case with standard ZrO/W(100) sources. Hence, operation is available over a much larger range of temperatures, fields, and potentially pressures. Operation in a commercial scanning electron microscope gave ten times higher beam currents for identical operational parameters over a standard Schottky source.

Volume

32

Issue

2

Comments

Originally published in the Journal of Vacuum Science and Technology, B32, 02B106. 2014.

http://scitation.aip.org/content/avs/journal/jvstb/32/2/10.1116/1.4862444

Recommended Citation

Mackie, William A.; Lovell, Josh M.; Curtis, Todd W.; and Megara, Gerald G., "HfC(310) High Brightness Sources for Advanced Imaging Applications" (2014). Faculty Publications - Biomedical, Mechanical, and Civil Engineering. 42.
https://digitalcommons.georgefox.edu/mece_fac/42